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Overview
Differential Scanning Calorimeter LMDSC-B102 features -170 to 600 ℃ temperature range. Its liquid nitrogen cooling system combined with dual temperature control enables ultra-low operations. Its high-sensitivity dual sensors, supported by multi-point calibration, ensure reliable readings. Its baseline deduction function and auto data plotting, streamline result interpretation and thermal event visualization. Our Differential Scanning Calorimeter is ideal for analysing melting point, crystallization, and reaction kinetics.
Features :
High-frequency processor
Optimized PID algorithm
7-inch LCD touchscreen
Independent atmosphere control
Automatic air path switching
USB bidirectional interface
Specifications :
| DSC Range | 0 to ±2000 mW |
| Temperature Range | -170 to 600 ℃ |
| Sampling Rate | 1 to 10 Hz (Programmable) |
| Toggle Rate | 16.6 Hz |
| Heating Rate | 0.1 to 100 ℃/min |
| Temperature Resolution | 0.001 ℃ / 0.01 ℃ |
| Temperature Repeatability | ±0.01 ℃ |
| Program Temperature Control | 12-stage |
| Temperature Control Type | Heating, constant temperature, cooling |
| Scan Type | Heating, cooling, isothermal scanning |
| DSC Noise | 0.01 mW |
| DSC Resolution | 0.01 µW |
| DSC Accuracy | 0.001 mW |
| DSC Sensitivity | 0.001 mW |
| Gas flow rate | 0 to 200mL/min |
| Gas pressure | 0.2MPa |
| Power Supply | 220V ,50 Hz |
| Dimension | 2350 × 1100 × 950 mm |
| Gross Weight | 40 Kg |
Standard Accessories :
Model No | Accessory | Unit | Quantity |
LMDSC-B102-H1 | DSC System Host | Set | 1 |
LMDSC-B102-H2 | Power Cord | Each | 1 |
LMDSC-B102-H3 | System Software USB | Each | 1 |
LMDSC-B102-H4 | Data Cable | Each | 1 |
LMDSC-B102-H5 | Aluminum Crucible | Each | 100 |
LMDSC-B102-H6 | Tweezers | Each | 1 |
LMDSC-B102-H7 | Fuses | Each | 5 |
LMDSC-B102-H8 | Trachea | Each | 2 |
LMDSC-B102-H9 | Sample Spoon | Each | 1 |
Applications :
Differential Scanning Calorimeter LMDSC-B102 is ideal for studying reaction kinetics, phase transitions, thermal stability, and heat capacity in polymers, pharmaceuticals, composites, and other process-optimization environments.