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Overview

Polarizing Microscope LMPM-802 with binocular viewing head inclined at 30°C is a robustly designed microscope with high-class fiber optics that provides high-quality long-life images. It has strain-free plan achromatic objectives of 4x and 10x for the reflected system and 20x, 40x, and 60x for the transmitted system. A high intensity 50W halogen light source with adjustable intensity and an abbe condenser with an iris diaphragm can be used to illuminate the sample. The sidentopf head, equipped with dual diopters and high-eyepoint eyepieces, provides a stable and adjustable viewing platform.

Specifications :
Viewing Head Binocular head inclined at 30°C
Eye Piece WF10X/20
Eyepiece WF10X/20 with cross hair
Eyepiece WF10X/20 with scale of cross hair
Grid plate
Nosepiece Backward quintuple nosepiece, center adjustable
Objectives Objective 4X, 10X for transmitted / reflected system
Objective 20X, 40X, 60X for transmitted system
Epi-illuminator 12V/50W halogen light source
Analyzer Rotatable analyzer with gradation 0°-360°
Optical Compensator λ slip, 1/4 λ, quartz wedge
Condenser Abbe condenser NA0.9 with iris diaphragm
Revolving Round Stage Diameter φ160mm, 1° increments, minimum resolution 6’
Focusing System Fine division 0.002mm, range 24mm
Polarizer 360° rotatable with filter
Bertrand Lens Focus/center adjustable sliding
Features :
  • -  Excellent infinite optical system
  • -  Wide Field Eyepieces 10x (20)
  • -  Polarizer rotatable but lockable in position
  • -  Infinity strain free plan objectives ensuring resolution and clarity
  • -  Center adjustable nosepiece and rotating platform makes operation more accurate and reliable
  • -  Easy to use interface also allows for customization of color and resolution settings
  • -  360° gradation with rotatable analyzer
  • -  50W halogen light source
  • -  Backward quintuple nose piece
  • -  Sidentopf binocular viewing head inclined at 30°C
Applications :

These are very commonly used in the clinical applications, material science investigations, research institutions etc.

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